Bauer, Anton ; Paskaleva, Albena ; Lemberger, Martin ; Frey, Lothar ; Ryssel, Heiner:
Thin HfxTiySizO Films with Varying Hf to Ti Contents as Candidates for High-k Dielecrics.
In: Gusev, E.P. ; Chen, L.J. ; Iwai, H. ; Kwong, D.-L. ; Öztürk, M.C. ; Roozeboom, F. ; Timans, P.J. (Hrsg.) : Advanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, Electrochemical Society Proceedings.
Bd. 5/2005. Pennington, N.J., USA : The Electrochemical Society, Inc., 2005, S. 125.
Institution: Lehrstuhl für Elektronische Bauelemente
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